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The advantage of RTP is the ability to heat or cool rapidly, which raises or lowers the temperature quickly, so cost of thermal process can be greatly reduced. AP Systems’ RTP equipment provides excellent temperature uniformity, wafer rotation, emissivity compensation, and intelligent temperature control.
It is a non-contact rotation using magnet properties (Magnetic Levitation), which secures excellent temperature uniformity within the surface.
Spec Items | Unit | Specification |
---|---|---|
Temperature Reading Range | ℃ | 400 ~ 1250 |
Temperature Control Range | ℃ | 435 ~ 1200 |
Temperature Ramping-Up Rate | ℃/sec | Up: 250℃/sec, Down: -90℃/sec |
Process Pressure | Torr | 780±2 ~ 1×10-3 |
RTO Range @ 1100℃, 60sec, X-scan, 49Points, 3 EE | Å, 1σ | ≤±0.5 |
Rs Range @ 700 ~ 1100℃, X-scan, 81Points, 3 EE | Ω/Sq, 1σ | ≤15 |
Pyrometer to Pyrometer Peak Temp Uniformity | ℃ | Target±1.0℃ @Bare Wafer |
RTO/Rs Non-uniformity | %,1σ | RTO: 0.48%, Rs: 0.72% |
RTO/Rs Repeatability | %,1σ | ≤1.5%, 1σ |
Temp. Stability & Repeatability | ℃ | <±1.0℃ |
Rs WTW Non-Uniformity | %,1σ | <1%, 1σ |
Mechanical Throughput (2 Chambers) | WPH | 142 |
Item | Description | Unit | Specification | Remarks | |
---|---|---|---|---|---|
EFEM | Load Port | Set | 2 ~ 3 | Class 10 | |
ATM-Robot & Aligner | Set | 1(Aligner: Option) | |||
TM (Option) | Load Lock | Set | 1(mTorr) | Particle Free | |
Transfer Chamber | Set | 1(mTorr) | |||
Process Module | Heater Block | Advanced Mosaic Array | Set | 1 ~ 3(mTorr) | |
Ch. Body | Cold Wall Chamber | Set | 1 ~ 3(mTorr) | ||
Lamp | Type | ea | 290(T Shape Bulb) | ||
Temp. Control | Temp. Control Performance | Control Range | ℃ | 435 ~ 1200℃ | ±0.5℃ Control (Option: Spike) |
Ramping-Up | ℃ | Max. +240℃/sec | |||
Ramping-Down | ℃ | Max. -80℃/sec | |||
Pyrometers per chamber | Quantity | ea | 5 | ||
Process | 49 Points RTO Range | Å | ≤1 @1σ | ||
49 Points Rs Non-Uniformity | % | ≤1 @1σ |